Brewer Science, Inc., has been issued a new patent by the U.S. Patent and Trademark Office: U.S. Patent No. 7,695,890 covers a new photosensitive composition useful as a protective layer in the manufacture of microelectronic devices used in microelectromechanical systems (MEMS).
Brewer Science's new invention provides a spin-applied, photosensitive coating system that replaces prior art masks or protective coatings, eliminating the need for additional photoresists. The new system protects device features from corrosion and other forms of attack during etching processes.
The invention will allow customers to save time and expense over previous technologies, which required additional protective layers and etching. This new technology will enhance throughput by reducing the number of process steps and simplify the process flow with minimal impact on overall performance.
The photosensitive etch protection coating can be used to create throughwafer pressure membranes and vias. The coating system also has applications in fabricating pressure sensors, silicon microphones, and RF MEMS devices.
Brewer Science delivers innovative material, process, and equipment solutions for various applications including lithography, advanced packaging, MEMS, nanotechnology, optoelectronics, and compound semiconductors. The inventor of ARC® anti-reflective coating products for the microlithography world, Brewer Science continues to expand its scope with ProTEK® temporary etch protective coatings, WaferBOND® temporary bonding materials, OptiNDEX™ high refractive coatings, CNTRENE™ microelectronics-grade carbon nanotube solutions, and Cee® processing equipment.
Learn more about Brewer Science by visiting www.brewerscience.com .
For more attend : Printed Electronics & Photovoltaics USA 2010 .