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Posted on March 22, 2012 by  & 

Applied Materials introduces advanced CVD films

Applied's new PECVD film technology produce higher-performance, high-resolution displays for next-generation tablet computers and TVs. Available on Applied's industry-leading AKT-PECVD system, these advanced insulating films enable the use of metal oxide-based transistors that produce smaller, faster-switching pixels to create higher resolution screens preferred by consumers.
Applied's new PECVD films provide a dielectric-layer interface for metal oxide transistors that minimizes hydrogen impurities to improve transistor stability and deliver optimized screen performance.
These high-quality silicon oxide (SiO2) films can be deposited by the AKT-PECVD system with precise uniformity on sheets of glass up to 9 m2 in size - a capability that is critical to achieving high production yields and low manufacturing costs.
"Display makers are aggressively investing in metal oxide transistor capability, and our advanced PECVD films overcome the uniformity and stability challenges of these complex dielectric films, clearing a major hurdle to implementing this important new technology," said Tom Edman, group vice president and general manager of Applied's AKT Display Business Group.
"By extending the capabilities of our world-class AKT-PECVD system to dielectric film deposition for metal oxide, Applied has provided a rapid, cost-effective path to help bring this technology to market. Customers have had excellent results with these new films on our system and we are seeing strong demand from major display manufacturers for upgrades and new systems."
In addition to its new PECVD films, Applied is currently developing advanced PVD solutions, including IGZO deposition, for metal oxide manufacturing. Using its latest rotary cathode array technology, Applied is demonstrating highly-uniform, homogeneous and low-defect, active-layer deposition at higher productivity rates and lower material consumption costs than currently available PVD solutions.
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